Method and apparatus for a pellicle frame with porous filtering inserts
View Patent ↗A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.
1. An apparatus for maintaining an optical gap between a pellicle and a reticle in a photolithography system, comprising:
a frame defining first and second opposing surfaces, said first opposing surface defining a first opening and being configured to mate with the pellicle and said second opposing surface defining a second opening and being configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle, wherein at least one edge of said frame has an opening therethrough; and
a porous material that fills said opening in said at least one edge of said frame, wherein the optical gap can be purged, wherein said porous material comprises sintered Invar.
2. The apparatus of claim 1 , wherein said porous material filters gas passing into said optical gap through said at least one edge of said frame.
3. The apparatus of claim 1 , further comprising:
a gas supply interface for infusing a purge gas through said porous material into said optical gap.
4. The apparatus of claim 3 , further comprising a vacuum source interface for evacuating said purge gas from said optical gap.
5. The apparatus of claim 4 , wherein said vacuum source interface evacuates said purge gas from said optical gap through said porous material.
6. The apparatus of claim 1 , further comprising:
a gas supply interface for infusing a purge gas through said frame, wherein said gas supply interface comprises a hole in an edge of said frame through which purge gas enters into said optical gap.
7. The apparatus of claim 1 , wherein said porous material is in the form of at least one insert that is positioned in said opening in said at least one edge of said frame.
8. The apparatus of claim 1 , wherein said opening in said at least one edge of said frame is rectangular shaped.
9. The apparatus of claim 1 , wherein said opening in said at least one edge of said frame is elliptical shaped.
10. The apparatus of claim 1 , wherein said frame comprises Invar.
11. A photolithography system, comprising:
a pellicle;
a reticle in optical alignment with said pellicle;
a frame disposed between said pellicle and said reticle to enclose a gap therebetween, wherein at least one edge of said frame has an opening therethrough; and
a porous material that fills said opening in said at least one edge of said frame, wherein the porous material comprises sintered Invar.
12. The system of claim 11 , further comprising:
a gas supply interface coupled to said frame for infusing a purge gas through said frame and into said gap.
13. The system of claim 11 , further comprising a vacuum source interface coupled to said frame for evacuating said purge gas from said gap through said frame.
14. The system of claim 11 , wherein said porous material is in the form of at least one rectangular insert that is positioned in said opening in said at least one edge of said frame.
15. The system of claim 11 , wherein said opening in said at least one edge of said frame is rectangular shaped.
16. The system of claim 11 , wherein said frame comprises Invar.
17. A method for maintaining a purged pellicle-to-reticle gap in a photolithography system, comprising:
(a) forming an air gap within a frame between a reticle and pellicle;
(b) positioning a porous material insert into an opening in at least one edge of the frame, wherein the porous material insert comprises sintered Invar; and
(c) passing a purge gas into the air gap through the frame.
18. The method of claim 17 , wherein step (a) comprises the steps of:
(1) attaching a pellicle to a first open surface of the frame; and
(2) attaching a reticle to a second open surface of the frame to form an air gap within the frame between the reticle and the pellicle.
19. The method of claim 17 , further comprising the step of:
(c) filtering the purge gas passed through the frame with the porous material insert positioned an opening in at least one edge of the frame.
20. The method of claim 17 , wherein the frame is made from Invar, wherein step (b) comprises:
positioning the porous material insert into the opening in the at least one edge of the Invar frame.
21. An apparatus for maintaining an optical gap between a pellicle and a reticle in a photolithography system, comprising:
a frame defining first and second opposing surfaces, said first opposing surface defining a first opening and being configured to mate with the pellicle and said second opposing surface defining a second opening and being configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle, wherein at least one edge of said frame has an opening therethrough; and
a porous material that fills said opening in said at least one edge of said frame, wherein the optical gap can be purged;
wherein said porous material is held in said opening without an adhesive and
wherein said porous sintered material is sintered Invar.
22. The apparatus of claim 21 , wherein said porous material is a porous sintered material.
23. The apparatus of claim 22 , wherein said porous sintered material comprises at least one of iron, copper, nickel, and titanium.