IP Library Assignment 011393/0036
Patent Assignment
Reel/Frame 011393/0036

Assignment of Assignor's Interest

Recorded: 2000-12-20 Pages: 2
Assignor
MIYAGAWA, SEIJI
Executed: 2000-12-15
Assignee
NEC CORPORATION
7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Method of Checking Exposure Patterns Formed Over Photo-Mask
Patent: 6,519,758 →
Application: 09/739,788 →
Publication: US 2001/0004765
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest May 13, 2003
From: NEC CORPORATION
To: NEC ELECTRONICS CORPORATION
Reel/Frame 013650/0099 →