Granted Patent
Utility
US 6,519,758 · App. 09/739,788
Method of checking exposure patterns formed over photo-mask
Inventor:
Seiji Miyagawa
Patented Case
View Patent ↗
Granted: Feb 11, 2003
Filed: Dec 20, 2000
Inventor
Seiji Miyagawa
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.