Assignment of Assignor's Interest

Recorded: 2001-01-10 Received: 2001-01-26 Pages: 3

Assignors

ISHIDA, SHINJI

Executed: 2000-11-20

IWASAKI, HARUO

Executed: 2000-11-20

YOSHII, TSUYOSHI

Executed: 2000-11-20

Assignee

NEC CORPORATION

7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JPX, JAPAN

Covered Property (1)

Photomask and Pattern Forming Method Used in a Thermal Flow Process and Semiconductor Integrated Circuit Fabricated Using the Thermal Flow Process

Application: 09/757,841 →