Assignment of Assignor's Interest

Recorded: 2001-01-29 Received: 2001-02-14 Pages: 2

Assignor

MUTOH, AKIRA

Executed: 2001-01-24

Assignee

NEC CORPORATION

MINATO-KU, 7-1 SHIBA 5 CHOME, TOKYO, JPX, JAPAN

Covered Property (1)

Method of and Apparatus for Developing Exposed Photoresist to Prevent Impurity from Being Attached to Wafer Surface

Application: 09/772,291 →