Patent Application
Utility
App. No. 09/772,291
· Confirmation No. 8592
METHOD OF AND APPARATUS FOR DEVELOPING EXPOSED PHOTORESIST TO PREVENT IMPURITY FROM BEING ATTACHED TO WAFER SURFACE
Inventor:
Akira Mutoh
Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2001-04-16 | DRW |
Drawings-only black and white line drawings | 15 | View | |
| 2001-01-29 | TRNA |
Transmittal of New Application | 1 | View | |
| 2001-01-29 | SPEC |
Specification | 27 | View | |
| 2001-01-29 | CLM |
Claims | 10 | View | |
| 2001-01-29 | ABST |
Abstract | 1 | View | |
| 2001-01-29 | DRW |
Drawings-only black and white line drawings | 15 | View | |
| 2001-01-29 | OATH |
Oath or Declaration filed | 1 | View |
Inventors
Akira Mutoh
Tokyo, JAPAN
Attorneys & Agents of Record
Classification
USPC
430/325
H10P76/00
G03F7/3021
Prosecution
- Examiner
- SCHILLING, RICHARD L
- Art Unit
- 1752
- Customer No.
- 26339
- Docket No.
- WAM-03501
- Confirmation No.
- 8592
Foreign Priority
2000-026206
·
2000-02-03
·
JAPAN
Publication
- Pub. No.
- US20010018167A1
- Pub. Date
- 2001-08-30
Patent Term Adjustment
0days
No related applications found.
from
NEC CORPORATION
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2003-03-03
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Quick Facts
- App. No.
- 09/772,291
- Filed
- 2001-01-29
- Granted
- 2003-04-15
- Pub. No.
- US20010018167A1
- Examiner
- SCHILLING, RICHARD L
- Art Unit
- 1752
- PTA
- 0 days
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