Patent Assignment
Reel/Frame 011543/0213
Assignment of Assignor's Interest
Recorded: 2001-02-14
Received: 2001-03-05
Pages: 2
Assignor
NAKAO, SHUJI
Executed: 2000-12-26
Assignee
MITSUBISHI DENKI KABUSHIKI KAISHA
CHIYODA-KU, 2-3, MARUNOUCHI 2-CHOME, TOKYO 100-8310, JPX, JAPAN
Covered Property
(1)
Method for Formation of Semiconductor Device Pattern, Method for Designing Photo Mask Pattern, Photo Mask and Process for Photo Mask
Application:
09/782,283 →