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App. No. 09/782,283 · Confirmation No. 8361

METHOD FOR FORMATION OF SEMICONDUCTOR DEVICE PATTERN, METHOD FOR DESIGNING PHOTO MASK PATTERN, PHOTO MASK AND PROCESS FOR PHOTO MASK

Inventor: Shuji Nakao
Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362 View Patent ↗ View Publication ↗
⬇ PDF
 Code Description Pages PDF
2001-02-14 TRNA Transmittal of New Application 2 View
2001-02-14 SPEC Specification 29 View
2001-02-14 CLM Claims 5 View
2001-02-14 ABST Abstract 1 View
2001-02-14 DRW Drawings-only black and white line drawings 36 View
2001-02-14 OATH Oath or Declaration filed 3 View
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Quick Facts
App. No.
09/782,283
Filed
2001-02-14
Granted
2003-08-12
Pub. No.
US20020028391A1
Examiner
SAGAR, KRIPA
Art Unit
1756
PTA
0 days