IP Library › Granted Patent US 6,709,792
Granted Patent Utility
US 6,709,792 · Confirmation No. 9797

METHOD FOR FORMATION OF SEMICONDUCTOR DEVICE PATTERN, METHOD FOR DESIGNING PHOTO MASK PATTERN, PHOTO MASK AND PROCESS FOR PHOTO MASK

Inventor: Shuji Nakao
Patented Case View Patent ↗ View Publication ↗
⬇ PDF
 Code Description Pages PDF
2004-02-10 IFEE Issue Fee Payment (PTO-85B) 1 View
2002-06-07 TRNA Transmittal of New Application 3 View
2002-06-07 SPEC Specification 29 View
2002-06-07 CLM Claims 5 View
2002-06-07 ABST Abstract 1 View
2002-06-07 DRW Drawings-only black and white line drawings 36 View
2002-06-07 OATH Oath or Declaration filed 3 View
2002-06-07 LET. Miscellaneous Incoming Letter 1 View
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this application's details
Quick Facts
Patent No.
US 6,709,792
App. No.
10/163,554
Filed
2002-06-07
Granted
2004-03-23
Pub. No.
US20020155395A1
Examiner
SAGAR, KRIPA
Art Unit
1756
PTA
0 days