IP Library Granted Patent US 6,706,453
Granted Patent Utility
US 6,706,453 · Confirmation No. 1853

METHOD FOR FORMATION OF SEMICONDUCTOR DEVICE PATTERN, METHOD FOR DESIGNING PHOTO MASK PATTERN, PHOTO MASK AND PROCESS FOR PHOTO MASK

Inventor: Shuji Nakao
⬇ PDF
Code Description Pages PDF
2004-01-21 LET. Miscellaneous Incoming Letter 1 View
2004-01-21 DRW Drawings-only black and white line drawings 1 View
2004-01-21 IFEE Issue Fee Payment (PTO-85B) 1 View
2002-06-07 TRNA Transmittal of New Application 3 View
2002-06-07 SPEC Specification 29 View
2002-06-07 CLM Claims 5 View
2002-06-07 ABST Abstract 1 View
2002-06-07 DRW Drawings-only black and white line drawings 36 View
2002-06-07 OATH Oath or Declaration filed 3 View
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Quick Facts
Patent No.
US 6,706,453
App. No.
10/163,458
Filed
2002-06-07
Granted
2004-03-16
Pub. No.
US20020150844A1
Examiner
SAGAR, KRIPA
Art Unit
1756
PTA
-56 days