Patent Assignment
Reel/Frame 015156/0715
Assignment of Assignor's Interest
Recorded: 2004-03-31
Pages: 2
Assignor
MISUBISHI DENKI KABUSHIKI KAISHA
Executed: 2004-03-24
Assignee
RENESAS TECHNOLOGY CORPORATION
4-1, MARUNOUCHI 2-CHOME, CHIYODA-KU, TOKYO 100-6334, JAPAN
Covered Property
(1)
Method for Formation of Semiconductor Device Pattern, Method for Designing Photo Mask Pattern, Photo Mask and Process for Photo Mask
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.