Assignment of Assignor's Interest

Recorded: 2001-02-06 Received: 2001-03-05 Pages: 3

Assignors

KAWAI, SATORU

Executed: 2001-01-25

OZAKI, KIYOSHI

Executed: 2001-01-25

TSUKAO, KOUJI

Executed: 2001-01-25

Assignee

FUJITSU LIMITED

1-1, KAMIKODANAKA 4-CHOME, NAKAHARA-KU, KAWASAKI, KANAGAWA 211-8588, JPX, JAPAN

Covered Properties (2)

Method for Formation of Semiconductor Device Pattern, Method for Designing Photo Mask Pattern, Photo Mask and Process for Photo Mask

Application: 09/782,283 →

Liquid Crystal Display Device and Defect Repairing Method Therefor

Application: 09/778,134 →