Patent Assignment
Reel/Frame 011600/0142
Assignment of Assignor's Interest
Recorded: 2001-03-09
Received: 2001-03-23
Pages: 3
Assignors
SUIZU, YASUMASA
Executed: 2001-02-26
INUMIYA, SEIJI
Executed: 2001-03-01
MIYANO, KIYOTAKA
Executed: 2001-03-01
OZAWA, YOSHIO
Executed: 2001-03-01
TANAKA, MASAYUKI
Executed: 2001-03-01
TSUNASHIMA, YOSHITAKA
Executed: 2001-03-01
Assignee
KABUSHIKI KAISHA TOSHIBA
SAIWAI-KU, 72 HORIKAWA-CHO, KAWASAKI-SHI, JPX, JAPAN
Covered Property
(1)
Semiconductor Device Having a Gate Insulating Film Structure Including an Insulating Film Containing Metal, Silicon and Oxygen and Manufacturing Method Thereof
Application:
09/803,265 →