Patent Assignment
Reel/Frame 011656/0903
Assignment of Assignor's Interest
Recorded: 2001-03-30
Received: 2001-04-12
Pages: 3
Assignee
NEC CORPORATION
7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JPX, JAPAN
Covered Property
(1)
A Method of Etching Polycrystalline Silicon Film by Using Two Consecutive Dry-Etching Processes
Application:
09/790,075 →