Patent Assignment
Reel/Frame 011661/0259
Assignment of Assignor's Interest
Recorded: 2001-04-04
Received: 2001-04-13
Pages: 2
Assignee
ALCATEL
54, RUE LA BOETIE, 75008 PARIS, FRX, FRANCE
Covered Property
(1)
Method for Tungsten Chemical Vapor Deposition on a Semiconductor Substrate
Application:
09/768,151 →