Patent Assignment
Reel/Frame 011666/0515
Assignment of Assignor's Interest
Recorded: 2001-04-04
Received: 2001-04-16
Pages: 3
Assignors
ANDO, KOICHI
Executed: 2001-03-23
KOYAMA, SHIN
Executed: 2001-03-23
MAKABE, MARIKO
Executed: 2001-03-23
Assignee
NEC CORPORATION
7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JPX, JAPAN
Covered Property
(1)
High-Performance Mos Transistor of Ldd Structure Having a Gate Insulating Film with a Nitride Central Portion and Oxide End Portions
Application:
09/824,672 →