IP Library Assignment 011666/0515
Patent Assignment
Reel/Frame 011666/0515

Assignment of Assignor's Interest

Recorded: 2001-04-04 Received: 2001-04-16 Pages: 3
Assignors
ANDO, KOICHI
Executed: 2001-03-23
KOYAMA, SHIN
Executed: 2001-03-23
MAKABE, MARIKO
Executed: 2001-03-23
Assignee
NEC CORPORATION
7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JPX, JAPAN
Covered Property (1)
High-Performance Mos Transistor of Ldd Structure Having a Gate Insulating Film with a Nitride Central Portion and Oxide End Portions
Application: 09/824,672 →