Patent Assignment
Reel/Frame 011723/0928
Assignment of Assignor's Interest
Recorded: 2001-04-17
Received: 2001-04-30
Pages: 2
Assignor
SANGO, TOSHIAKI
Executed: 2001-04-03
Assignee
NEC CORPORATION
7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JPX, JAPAN
Covered Property
(1)
Dry Etching System for Patterning Target Layer at High Reproducibility and Method of Dry Etching Used Therein
Application:
09/836,649 →