IP Library Patent Application 09836649
Patent Application Utility
App. No. 09/836,649 · Confirmation No. 7325

DRY ETCHING SYSTEM FOR PATTERNING TARGET LAYER AT HIGH REPRODUCIBILITY AND METHOD OF DRY ETCHING USED THEREIN

Inventor: Toshiaki Sango
Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362 View Patent ↗ View Publication ↗
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Code Description Pages PDF
2001-04-17 TRNA Transmittal of New Application 1 View
2001-04-17 ADS Application Data Sheet 1 View
2001-04-17 SPEC Specification 19 View
2001-04-17 CLM Claims 5 View
2001-04-17 ABST Abstract 1 View
2001-04-17 DRW Drawings-only black and white line drawings 3 View
2001-04-17 OATH Oath or Declaration filed 1 View
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Quick Facts
App. No.
09/836,649
Filed
2001-04-17
Granted
2002-05-21
Pub. No.
US20010032707A1
Art Unit
1763
PTA
0 days