Patent Application
Utility
App. No. 09/836,649
· Confirmation No. 7325
DRY ETCHING SYSTEM FOR PATTERNING TARGET LAYER AT HIGH REPRODUCIBILITY AND METHOD OF DRY ETCHING USED THEREIN
Inventor:
Toshiaki Sango
Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2001-04-17 | TRNA |
Transmittal of New Application | 1 | View | |
| 2001-04-17 | ADS |
Application Data Sheet | 1 | View | |
| 2001-04-17 | SPEC |
Specification | 19 | View | |
| 2001-04-17 | CLM |
Claims | 5 | View | |
| 2001-04-17 | ABST |
Abstract | 1 | View | |
| 2001-04-17 | DRW |
Drawings-only black and white line drawings | 3 | View | |
| 2001-04-17 | OATH |
Oath or Declaration filed | 1 | View |
Inventors
Toshiaki Sango
Tokyo, JAPAN
Attorneys & Agents of Record
Classification
USPC
438/706
H01J37/32082
H01J37/32449
H10P72/0421
H10P95/062
H01J37/3299
H01J2237/2001
Prosecution
- Examiner
- GOUDREAU, GEORGE A
- Art Unit
- 1763
- Docket No.
- K1509.0061 / P061
- Confirmation No.
- 7325
Foreign Priority
2000-118275
·
2000-04-19
·
JAPAN
Publication
- Pub. No.
- US20010032707A1
- Pub. Date
- 2001-10-25
Patent Term Adjustment
0days
No related applications found.
from
NEC CORPORATION
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2003-02-25
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Quick Facts
- App. No.
- 09/836,649
- Filed
- 2001-04-17
- Granted
- 2002-05-21
- Pub. No.
- US20010032707A1
- Examiner
- GOUDREAU, GEORGE A
- Art Unit
- 1763
- PTA
- 0 days
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