Assignment of Assignor's Interest

Recorded: 2001-04-19 Received: 2001-05-02 Pages: 2

Assignors

LEE, SHYH-DAR

Executed: 2001-03-24

HSUE, CHEN-CHUI

Executed: 2001-03-29

Assignee

SILICON INTEGRATED SYSTEMS, CORP

NO 16, CREATION ROAD, 1, SCIENCE-BASED INDUSTRIAL PARK, HSIN CHU, TWX, R.O.C, TAIWAN

Covered Property (1)

Dual Damascene Process Using an Oxide Liner for a Dielectric Barrier Layer

Application: 09/841,568 →