IP Library Assignment 011779/0656
Patent Assignment
Reel/Frame 011779/0656

Assignment of Assignor's Interest

Recorded: 2001-05-03 Received: 2001-05-14 Pages: 3
Assignor
YAMADA, YASUHISA
Executed: 2001-04-27
Assignee
NEC CORPORATION
7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JPX, JAPAN
Covered Property (1)
Mask for Electron Beam Drawing Utilizing Auxiliary Patterns That Do Not Bore Through the Substrate
Application: 09/848,124 →