Assignment of Assignor's Interest

Recorded: 2001-06-01 Pages: 2

Assignor

LIU, ZIYUAN

Executed: 2001-05-16

Assignee

NEC CORPORATION

7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JAPAN

Covered Property (1)

Low-resistive tungsten silicide layer strongly adhered to lower layer and semiconductor device using the same

Application: 09/870,688 →

Publication: US 2001/0051428

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.