Patent Application
Utility
App. No. 09/870,688
· Confirmation No. 7684
Low-resistive tungsten silicide layer strongly adhered to lower layer and semiconductor device using the same
Inventor:
Ziyuan Liu
Abandoned -- Failure to Respond to an Office Action
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2001-06-01 | TRNA |
Transmittal of New Application | 2 | View | |
| 2001-06-01 | SPEC |
Specification | 21 | View | |
| 2001-06-01 | CLM |
Claims | 3 | View | |
| 2001-06-01 | ABST |
Abstract | 1 | View | |
| 2001-06-01 | DRW |
Drawings-only black and white line drawings | 5 | View | |
| 2001-06-01 | OATH |
Oath or Declaration filed | 2 | View | |
| 2001-06-01 | LET. |
Miscellaneous Incoming Letter | 1 | View |
Inventors
Ziyuan Liu
Tokyo, JAPAN
Attorneys & Agents of Record
Classification
USPC
438/683
H10W20/031
H10P14/414
H10D64/01312
C23C16/42
C23C16/56
Prosecution
- Examiner
- SMOOT, STEPHEN W
- Art Unit
- 2813
- Docket No.
- 018901-0179
- Confirmation No.
- 7684
Foreign Priority
2000-204351
·
2000-06-02
·
JAPAN
Publication
- Pub. No.
- US20010051428A1
- Pub. Date
- 2001-12-13
from
NEC CORPORATION
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2003-02-19
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Quick Facts
- App. No.
- 09/870,688
- Filed
- 2001-06-01
- Pub. No.
- US20010051428A1
- Examiner
- SMOOT, STEPHEN W
- Art Unit
- 2813
External Links