Patent Assignment
Reel/Frame 011909/0646
Assignment of Assignor's Interest
Recorded: 2001-06-15
Pages: 2
Assignee
SILICON INTEGRATED SYSTEMS CORP.
NO. 16, CREATION RD. 1, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU, R.O.C, TAIWAN
Covered Property
(1)
Method for forming metal capacitors with a damascene process
Patent:
6,338,999 →
Application:
09/880,782 →
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.