IP Library Assignment 015621/0932
Patent Assignment
Reel/Frame 015621/0932

Assignment of Assignor's Interest

Recorded: 2005-01-27 Pages: 3
Assignor
SILICON INTEGRATED SYSTEMS CORP.
Executed: 2005-01-26
Assignee
UNITED MICROELECTRONICS CORP.
NO. 3, LI-HSIN RD. II, SCIENCE-BASED INDUSTRIAL PARK, HSINCHU, R.O.C., TAIWAN
Covered Properties (39)
Fixing Device for Setting Anti-Shock Foot Stand
Patent: 6,409,129 →
Application: 09/654,228 →
Dual Damascene Process Using an Oxide Liner for a Dielectric Barrier Layer
Patent: 6,486,059 →
Application: 09/841,568 →
Publication: US 2002/0155695
Method of Rapid Prevention of Particle Pollution in Pre-Clean Chambers
Patent: 6,516,814 →
Application: 09/847,319 →
Publication: US 2002/0162569
Method of Prevention of Particle Pollution in a Pre-Clean Chamber
Patent: 6,537,622 →
Application: 09/848,375 →
Publication: US 2002/0164435
Method for Forming a Dual Damascene Structure Having Capacitors
Patent: 6,391,713 →
Application: 09/854,872 →
Method for Measuring Width of Bottom Under Cut During Etching Process
Patent: 6,521,138 →
Application: 09/873,157 →
Publication: US 2002/0179568
Method for forming metal capacitors with a damascene process
Patent: 6,338,999 →
Application: 09/880,782 →
Method for Forming a Metal Capacitor in a Damascene Process
Patent: 6,492,226 →
Application: 09/880,849 →
Publication: US 2002/0192921
Method for fabricating metal capacitor
Patent: 6,358,792 →
Application: 09/881,101 →
Method for Forming a Metal Capacitor in a Damascene Process
Patent: 6,410,386 →
Application: 09/881,102 →
Method for Forming Selective Protection Layers on Copper Interconnects
Patent: 6,521,523 →
Application: 09/881,103 →
Publication: US 2002/0192940
Dual Damascene Process Using Metal Hard Mask
Patent: 6,696,222 →
Application: 09/910,876 →
Publication: US 2003/0044725
Organic Copper Diffusion Barrier Layer
Patent: 6,503,835 →
Application: 09/939,606 →
Apparatus and Method for Cleaning Wafers with Contact Holes or via Holes
Patent: 6,561,204 →
Application: 09/945,634 →
Publication: US 2003/0042225
Scrubbing Assembly for Wafer-Cleaning Device
Patent: 6,651,284 →
Application: 09/973,706 →
Publication: US 2003/0070242
Method for Removing the Circumferential Edge of a Dielectric Layer
Patent: 6,596,088 →
Application: 09/985,687 →
Publication: US 2003/0084922
Metal Capacitors with Damascene Structures and Method for Forming the Same
Patent: 6,495,877 →
Application: 10/024,289 →
Publication: US 2002/0190300
Metal Capacitors with Damascene Structures
Patent: 6,504,205 →
Application: 10/024,711 →
Publication: US 2002/0190386
Process for Device Isolation
Patent: 6,489,193 →
Application: 10/040,442 →
Method of Reducing Micro-Scratches During Tungsten Cmp
Patent: 6,548,409 →
Application: 10/076,395 →
Method of Forming a Stacked Dielectric Layer on a Semiconductor Substrate Having Metal Patterns
Patent: 6,593,225 →
Application: 10/087,773 →
Capacitor with Lower Electrode Located at the Same Level as an Interconnect Line
Patent: 6,603,167 →
Application: 10/093,531 →
Publication: US 2002/0190301
Method for Fabricating Polysilicon Capacitor
Patent: 6,514,815 →
Application: 10/093,538 →
Publication: US 2002/0192922
Method for Manufacturing a Mos Device with Improved Well Control Stability
Patent: 6,509,238 →
Application: 10/100,676 →
Metal Capacitor in Damascene Structures
Patent: 6,512,260 →
Application: 10/107,482 →
Publication: US 2002/0190299
Dual Damascene Structure Having Capacitors
Patent: 6,483,142 →
Application: 10/108,611 →
Publication: US 2002/0167090
Method of Forming Salicide
Patent: 6,696,354 →
Application: 10/131,099 →
Publication: US 2003/0228742
Method for Improving Adhesion of a Low K Dielectric to a Barrier Layer
Patent: 6,649,512 →
Application: 10/165,739 →
Publication: US 2003/0228750
Dual Damascene Process
Patent: 6,495,448 →
Application: 10/165,794 →
Storage and management method for a multi-floor stocker system
Application: 10/230,062 →
Publication: US 2004/0054543
Method of Forming a Metal-Oxide Semiconductor Transistor
Patent: 6,743,690 →
Application: 10/237,605 →
Publication: US 2004/0048438
Method of Forming Shallow Trench Isolation in a Semiconductor Substrate
Patent: 6,784,075 →
Application: 10/237,608 →
Publication: US 2004/0048442
Method of Forming Shallow Trench Isolation in a Semiconductor Substrate
Patent: 6,720,235 →
Application: 10/237,693 →
Publication: US 2004/0048443
Method of Forming a Shallow Trench Isolation Structure
Patent: 6,727,160 →
Application: 10/270,348 →
Publication: US 2004/0072400
Method of etching a low-k dielectric layer
Application: 10/321,565 →
Publication: US 2004/0121604
Method of etching a metal line
Application: 10/372,842 →
Publication: US 2004/0166691
Methodology of Locating Faults of Scan Chains in Logic Integrated Circuits
Patent: 7,076,707 →
Application: 10/401,701 →
Publication: US 2004/0181722
Method of Fabricating Stacked Gate Dielectric Layer
Application: 10/446,871 →
Publication: US 2004/0241948
Method of Improving Surface Planarity
Patent: 6,979,367 →
Application: 10/637,598 →
Publication: US 2005/0037616
Related Assignments (12)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Aug 28, 2001
From: LEE, SHYH-DAR
To: SILICON INTEGRATED SYSTEMS CORP.
Reel/Frame 012129/0110 →
Assignment of Assignor's Interest Sep 5, 2001
From: TSAI, LUNG HUI; HUANG, YU-LING; CHANG, HSIN YI
To: SILICON INTEGRATED SYSTEMS CORP.
Reel/Frame 012160/0191 →
Assignment of Assignor's Interest Oct 11, 2001
From: TSENG, KAO-MAO; TSENG, SU-LING; CHANG, HSIN YI
To: SILICON INTEGRATED SYSTEMS CORP.
Reel/Frame 012249/0301 →
Assignment of Assignor's Interest Nov 5, 2001
From: HUANG, YU-LING; TSAI, LUNG HUI
To: SILICON INTEGRATED SYSTEMS CORPS.
Reel/Frame 012296/0796 →
Assignment of Assignor's Interest Dec 21, 2001
From: HSUE, CHEN-CHIU; LEE, SHYH-DAR
To: SILICON INTEGRATED SYSTEMS CORPORATION
Reel/Frame 012401/0275 →
Assignment of Assignor's Interest Dec 21, 2001
From: HSUE, CHEN-CHIU; LEE, SHYH-DAR
To: SILICON INTEGRATED SYSTEMS CORPORATION
Reel/Frame 012401/0331 →
Assignment of Assignor's Interest Jan 9, 2002
From: CHEN, LUNG; WANG, TENG-FENG; YANG, ZEN-LONG; CHANG, SHIH-HUI
To: SILICON INTEGRATED SYSTEMS CORP.
Reel/Frame 012464/0805 →
Assignment of Assignor's Interest Jul 18, 2011
From: UNITED MICROELECTRONICS CORP.
To: INTELLECTUAL VENTURES FUND 74 LLC
Reel/Frame 026605/0333 →
Assignment of Assignor's Interest Jul 26, 2021
From: UNITED MICROELECTRONICS CORPORATION
To: MARLIN SEMICONDUCTOR LIMITED
Reel/Frame 056991/0292 →
Assignment of Assignor's Interest Feb 12, 2023
From: INTELLECTUAL VENTURES HOLDING 81 LLC
To: INTELLECTUAL VENTURES ASSETS 186 LLC
Reel/Frame 062667/0369 →
Security Interest Mar 24, 2023
From: MIND FUSION, LLC
To: INTELLECTUAL VENTURES ASSETS 191 LLC; INTELLECTUAL VENTURES ASSETS 186 LLC
Reel/Frame 063295/0001 →
Assignment of Assignor's Interest Jul 13, 2023
From: INTELLECTUAL VENTURES ASSETS 186 LLC
To: MIND FUSION, LLC
Reel/Frame 064271/0001 →