IP Library › Granted Patent US 6,696,222
Granted Patent Utility
US 6,696,222 · App. 09/910,876

Dual damascene process using metal hard mask

Inventors: Chen-Chiu Hsue, Shyh-Dar Lee
Patented Case View Patent ↗
Granted: Feb 24, 2004 Filed: Jul 24, 2001
Inventors
Chen-Chiu Hsue
Shyh-Dar Lee
Assignee (at issue)
Silicon Integrated Systems Corp.

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Quick Facts
Patent No.
US 6,696,222
App. No.
09/910,876
Filed
2001-07-24
Granted
2004-02-24
Kind
B2