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App. No. 10/321,565 · Confirmation No. 4700

Method of etching a low-k dielectric layer

Abandoned -- Failure to Respond to an Office Action View Publication ↗
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2006-01-03 ABN Abandonment 2 View
2005-05-19 CTFR Final Rejection 7 View
2005-05-19 FWCLM Index of Claims 1 View
2005-03-09 N570 Communication - Re: Power of Attorney (PTOL-308) 2 View
2005-03-09 FWCLM Index of Claims 1 View
2005-02-18 A... Amendment/Request for Reconsideration-After Non-Final Rejection 2 View
2005-02-18 CLM Claims 3 View
2005-02-18 REM Applicant Arguments/Remarks Made in an Amendment 4 View
2005-02-18 PA.. Power of Attorney 1 View
2005-02-18 C.AD Change of Address 2 View
2005-02-18 WFEE Fee Worksheet (SB06) 1 View
2004-11-18 CTNF Non-Final Rejection 5 View
2004-11-18 1449 List of References cited by applicant and considered by examiner 1 View
2004-11-18 892 List of references cited by examiner 1 View
2004-11-18 FWCLM Index of Claims 1 View
2004-11-18 SRFW Search information including classification, databases and other search related notes 1 View
2004-11-18 BIB Bibliographic Data Sheet 1 View
2003-03-11 IDS Information Disclosure Statement (IDS) Form (SB08) 6 View
2002-12-18 TRNA Transmittal of New Application 3 View
2002-12-18 SPEC Specification 6 View
2002-12-18 CLM Claims 3 View
2002-12-18 ABST Abstract 1 View
2002-12-18 DRW Drawings-only black and white line drawings 3 View
2002-12-18 OATH Oath or Declaration filed 2 View
2002-12-18 136A Authorization for Extension of Time all replies 3 View
2002-12-18 WFEE Fee Worksheet (SB06) 1 View
2002-12-18 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
App. No.
10/321,565
Filed
2002-12-18
Pub. No.
US20040121604A1
Art Unit
1765