Patent Assignment
Reel/Frame 013592/0390
Assignment of Assignor's Interest
Recorded: 2002-12-18
Pages: 3
Assignors
NIEH, CHUN-FENG
Executed: 2002-11-19
WANG, CHING-FAN
Executed: 2002-11-20
CHENG, FANG-HSU
Executed: 2002-11-20
CHEN, ZHEN-LONG
Executed: 2002-11-20
Assignee
SILICON INTEGRATED SYSTEMS CORP.
NO. 16, CREATION RD., SCIENCE-BASED INDUSTRIAL PARK, HSIN CHU, R.O.C., TAIWAN
Covered Property
(1)
Method of etching a low-k dielectric layer
Application:
10/321,565 →
Publication:
US 2004/0121604
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.