Assignment of Assignor's Interest

Recorded: 2001-08-28 Pages: 3

Assignor

LEE, SHYH-DAR

Executed: 2001-08-07

Assignee

SILICON INTEGRATED SYSTEMS CORP.

SCIENCE-BASED INDUSTRIAL PARK, NO. 16, CREATION RD. 1, HSINCHU, R.O.C, TAIWAN

Covered Property (1)

Organic Copper Diffusion Barrier Layer

Patent: 6,503,835 →

Application: 09/939,606 →

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.