Patent Assignment
Reel/Frame 011924/0053
Assignment of Assignor's Interest
Recorded: 2001-06-20
Received: 2001-06-28
Pages: 7
Assignors
RAMSBEY, MARK T.
Executed: 2001-05-16
RANDOLPH, MARK
Executed: 2001-05-16
DERHACOBIAN, NARBEH
Executed: 2001-06-12
SUNKAVALLI, RAVI
Executed: 2001-06-12
WANG, JANET
Executed: 2001-06-12
PHAM, TUAN
Executed: 2001-06-16
HUI, ANGELA
Executed: 2001-06-19
Assignee
ADVANCED MICRO DEVICES, INC.
ONE AMD PLACE, P.O. BOX 3453, SUNNYVALE, CA, 94088, UNITED STATES
Covered Properties
(2)
Method of Manufacturing Spacer Etch Mask for Silicon-Oxide-Nitride-Oxide-Silicon (Sonos) Type Nonvolatile Memory
Application:
09/885,490 →
Method and Apparatus for Rapid Grain Size Analysis of Polycrystalline Materials
Application:
09/884,791 →