IP Library › Granted Patent US 6,465,303
Granted Patent Utility
US 6,465,303 · Confirmation No. 4442

METHOD OF MANUFACTURING SPACER ETCH MASK FOR SILICON-OXIDE-NITRIDE-OXIDE-SILICON (SONOS) TYPE NONVOLATILE MEMORY

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 Code Description Pages PDF
2001-06-20 TRNA Transmittal of New Application 4 View
2001-06-20 SPEC Specification 11 View
2001-06-20 CLM Claims 4 View
2001-06-20 ABST Abstract 1 View
2001-06-20 DRW Drawings-only black and white line drawings 4 View
2001-06-20 OATH Oath or Declaration filed 3 View
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Quick Facts
Patent No.
US 6,465,303
App. No.
09/885,490
Filed
2001-06-20
Granted
2002-10-15
Examiner
LE, DUNG ANH
Art Unit
2818
PTA
0 days