Assignment of Assignor's Interest

Recorded: 2001-12-21 Pages: 2

Assignors

HASEGAWA, NORIO

Executed: 2001-10-29

TANAKA, TOSHIHIKO

Executed: 2001-10-30

TERASAWA, TSUNEO

Executed: 2001-11-10

Assignee

HITACHI, LTD.

6, KANDA SURUGADAI 4-CHOME, CHIYODA-KU, TOKYO, JAPAN

Covered Property (1)

Device manufacturing method, photomask used for the method, and photomask manufacturing method

Application: 10/023,893 →

Publication: US 2002/0081501

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.