Patent Application
Utility
App. No. 10/023,893
· Confirmation No. 5399
Device manufacturing method, photomask used for the method, and photomask manufacturing method
Abandoned -- Failure to Respond to an Office Action
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2015-12-21 | EBCC.AD |
Notice of Change of Address Place in File Wrapper Due to Electronic Business Center(EBC) Customer Number Update | 1 | View | |
| 2001-12-21 | TRNA |
Transmittal of New Application | 4 | View | |
| 2001-12-21 | SPEC |
Specification | 55 | View | |
| 2001-12-21 | CLM |
Claims | 2 | View | |
| 2001-12-21 | ABST |
Abstract | 1 | View | |
| 2001-12-21 | DRW |
Drawings-only black and white line drawings | 27 | View | |
| 2001-12-21 | OATH |
Oath or Declaration filed | 4 | View |
Inventors
Attorneys & Agents of Record
Classification
USPC
430/5
H10P76/00
G03F1/56
G03F7/168
Prosecution
- Examiner
- BARRECA, NICOLE M
- Art Unit
- 1756
- Customer No.
- 137137
- Docket No.
- XA-9603
- Confirmation No.
- 5399
Foreign Priority
2000-393232
·
2000-12-25
·
JAPAN
Publication
- Pub. No.
- US20020081501A1
- Pub. Date
- 2002-06-27
No related applications found.
from
HITACHI, LTD.
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2003-12-11
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2001-12-21
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Quick Facts
- App. No.
- 10/023,893
- Filed
- 2001-12-21
- Pub. No.
- US20020081501A1
- Examiner
- BARRECA, NICOLE M
- Art Unit
- 1756
External Links