Assignment of Assignor's Interest

Recorded: 2001-12-27 Received: 2002-01-07 Pages: 2

Assignors

HAYANO, KATSUYA

Executed: 2001-11-26

HASEGAWA, NORIO

Executed: 2001-11-27

Assignee

HITACHI, LTD.

6, KANDA SURUGADAI 4-CHOME, CHIYODA-KU, TOKYO, JPX, JAPAN

Covered Properties (2)

Method of Manufacturing Photomask and Method of Manufacturing Semiconductor Integrated Circuit Device

Application: 10/026,772 →

A Friction Clutch Comprising a Friction Element Formed of Flake Graphite Alloy

Application: 10/027,739 →