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App. No. 10/026,772 · Confirmation No. 9810

METHOD OF MANUFACTURING PHOTOMASK AND METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362 View Patent ↗ View Publication ↗
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 Code Description Pages PDF
2003-12-16 IFEE Issue Fee Payment (PTO-85B) 1 View
2003-12-16 A.NA Amendment after Notice of Allowance (Rule 312) 1 View
2003-12-16 CLM Claims 15 View
2003-12-16 REM Applicant Arguments/Remarks Made in an Amendment 2 View
2001-12-27 TRNA Transmittal of New Application 3 View
2001-12-27 SPEC Specification 72 View
2001-12-27 CLM Claims 14 View
2001-12-27 ABST Abstract 1 View
2001-12-27 DRW Drawings-only black and white line drawings 45 View
2001-12-27 OATH Oath or Declaration filed 4 View
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Quick Facts
App. No.
10/026,772
Filed
2001-12-27
Granted
2004-03-16
Pub. No.
US20020081502A1
Art Unit
1756
PTA
-39 days