IP Library › Assignment 012566/0050
Patent Assignment
Reel/Frame 012566/0050

Assignment of Assignor's Interest

Recorded: 2002-02-06 Pages: 3
Assignors
KATO, HITOSHI
Executed: 2002-02-01
FUKUSHIMA, KOHEI
Executed: 2002-02-01
ENDO, ATSUSHI
Executed: 2002-02-01
NISHITA, TATSUO
Executed: 2002-02-01
KUMAGAI, TAKESHI
Executed: 2002-02-01
Assignee
TOKYO ELECTRON LIMITED
3-6, AKASAKA 5-CHOME, MINATO-KU, TOKYO-TO, JAPAN
Covered Property (1)
A Precleaning Method of Precleaning a Silicon Nitride Film Forming System
Patent: 6,844,273 →
Application: 10/066,627 →
Publication: US 2002/0106909