Patent Assignment
Reel/Frame 012827/0209
Assignment of Assignor's Interest
Recorded: 2002-04-18
Received: 2002-04-29
Pages: 2
Assignor
UEDA, YASUHIKO
Executed: 2002-04-12
Assignees
NEC CORPORATION
7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JPX, JAPAN
HITACHI LTD.
6, KANDA SURUGADAI 4-CHOME, CHIYODA-KU, TOKYO, JPX, JAPAN
Covered Property
(1)
Method of Removing Silicon Nitride Film Formed on a Surface of a Material with a Process Gas Containing a Higher-Order Fluorocarbon in Combination with a Lower-Order Fluorocarbon
Application:
10/124,398 →