IP Library Granted Patent US 6,569,776
Granted Patent Utility
US 6,569,776 · Confirmation No. 8218

METHOD OF REMOVING SILICON NITRIDE FILM FORMED ON A SURFACE OF A MATERIAL WITH A PROCESS GAS CONTAINING A HIGHER-ORDER FLUOROCARBON IN COMBINATION WITH A LOWER-ORDER FLUOROCARBON

Inventor: Yasuhiko Ueda
⬇ PDF
Code Description Pages PDF
2002-04-18 TRNA Transmittal of New Application 1 View
2002-04-18 SPEC Specification 20 View
2002-04-18 CLM Claims 4 View
2002-04-18 ABST Abstract 1 View
2002-04-18 DRW Drawings-only black and white line drawings 12 View
2002-04-18 OATH Oath or Declaration filed 2 View
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this application's details
Quick Facts
Patent No.
US 6,569,776
App. No.
10/124,398
Filed
2002-04-18
Granted
2003-05-27
Pub. No.
US20020155726A1
Art Unit
2824
PTA
0 days