Patent Assignment
Reel/Frame 012836/0427
Assignment of Assignor's Interest
Recorded: 2002-04-26
Received: 2002-05-01
Pages: 3
Assignors
INOUE, SOICHI
Executed: 2002-04-03
KOTANI, TOSHIYA
Executed: 2002-04-03
TANAKA, SATOSHI
Executed: 2002-04-03
Assignee
KABUSHIKI KAISHA TOSHIBA
1-1 SHIBAURA, 1-CHOME, MINATO-KU, TOKYO, JPX, JAPAN
Covered Properties
(3)
Pattern Formation Method, Mask for Exposure Used for Pattern Formation, and Method of Manufacturing the Same
Application:
10/132,197 →
Log Saw Apparatus and Method
Application:
10/131,372 →
Two-Mass, Base-Excited Conveyor
Application:
10/007,843 →