IP Library Granted Patent US 6,727,028
Granted Patent Utility
US 6,727,028 · Confirmation No. 9167

PATTERN FORMATION METHOD, MASK FOR EXPOSURE USED FOR PATTERN FORMATION, AND METHOD OF MANUFACTURING THE SAME

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2008-05-07 EBCC.AD Notice of Change of Address Place in File Wrapper Due to Electronic Business Center(EBC) Customer Number Update 1 View
2008-04-02 EBCC.AD Notice of Change of Address Place in File Wrapper Due to Electronic Business Center(EBC) Customer Number Update 1 View
2004-03-17 IFEE Issue Fee Payment (PTO-85B) 1 View
2002-04-26 TRNA Transmittal of New Application 3 View
2002-04-26 SPEC Specification 18 View
2002-04-26 CLM Claims 6 View
2002-04-26 ABST Abstract 1 View
2002-04-26 DRW Drawings-only black and white line drawings 5 View
2002-04-26 OATH Oath or Declaration filed 2 View
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Quick Facts
Patent No.
US 6,727,028
App. No.
10/132,197
Filed
2002-04-26
Granted
2004-04-27
Pub. No.
US20020160279A1
Art Unit
1756
PTA
0 days