IP Library Assignment 013005/0964
Patent Assignment
Reel/Frame 013005/0964

Assignment of Assignor's Interest

Recorded: 2002-06-24 Pages: 3
Assignors
TOIS, EVA
Executed: 2002-06-04
HAUKKA, SUVI
Executed: 2002-05-22
TUOMINEN, MARKO
Executed: 2002-05-21
Assignee
ASM MICROCHEMISTRY OY
KUTOJANTIE 2 B, ESPOO, FIN-0, FINLAND
Covered Property (1)
Atomic-Layer-Chemical-Vapor-Deposition of Films That Contain Silicon Dioxide
Patent: 7,771,533 →
Application: 10/148,525 →
Publication: US 2003/0188682
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Dec 23, 2003
From: ASM MICROCHEMISTRY OY
To: ASM INTERNATIONAL N.V.
Reel/Frame 014852/0964 →
Assignment of Assignor's Interest Dec 4, 2018
From: ASM INTERNATIONAL N.V.; ASM NETHERLANDS HOLDING B.V.
To: ASM IP HOLDING B.V.
Reel/Frame 047669/0332 →