IP Library Assignment 013200/0591
Patent Assignment
Reel/Frame 013200/0591

Assignment of Assignor's Interest

Recorded: 2002-08-15 Pages: 2
Assignors
TAKAHASHI, YOUJI
Executed: 2002-08-09
KASHIBE, MAKOTO
Executed: 2002-08-09
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHINBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Apparatus and Method
Patent: 7,025,895 →
Application: 10/218,422 →
Publication: US 2004/0031566
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →