Patent Assignment
Reel/Frame 013238/0884
Assignment of Assignor's Interest
Recorded: 2002-08-27
Received: 2002-09-04
Pages: 5
Assignors
ZEDLITZ, RALF
Executed: 2001-07-09
WEGE, STEPHAN
Executed: 2001-07-11
DREYBRODT, JOERG
Executed: 2001-07-27
DRESCHER, DIRK
Executed: 2001-07-29
Assignee
SIEMENS AKTIENGESELLSCHAFT
POSTFACH 22 16 34, ZT GG VM, MUNCHEN, DEX, 80506, GERMANY
Covered Property
(1)
Method of Structuring Layers with a Polysilicon Layer and an Overlying Metal or Metal Silicide Layer Using a Three Step Etching Process with Fluorine, Chlorine, Bromine Containing Gases
Application:
09/884,188 →