IP Library › Assignment 013275/0428
Patent Assignment
Reel/Frame 013275/0428

Assignment of Assignor's Interest

Recorded: 2002-09-06 Pages: 3
Assignors
MIN, KYU S.
Executed: 2002-09-03
KARPENKO, OLEH P.
Executed: 2002-09-03
Assignee
INTEL CORPORATION
2200 MISSION BLVD., SANTA CLARA, CALIFORNIA, 95054-1549
Covered Property (1)
In-Situ Sequential High Density Plasma Deposition and Etch Processing for Gap Fill
Patent: 7,223,701 →
Application: 10/236,203 →
Publication: US 2004/0048485
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Oct 18, 2011
From: NUMONYX B.V.
To: MICRON TECHNOLOGY, INC.
Reel/Frame 027075/0682 →
Assignment of Assignor's Interest Apr 17, 2012
From: INTEL CORPORATION
To: NUMONYX B.V.
Reel/Frame 028055/0625 →