IP Library Assignment 013334/0577
Patent Assignment
Reel/Frame 013334/0577

Assignment of Assignor's Interest

Recorded: 2002-09-24 Pages: 2
Assignor
SHU, SHIH-CHI
Executed: 2002-09-19
Assignee
NANYA TECHNOLOGY CORPORATION
HWA-YA TECHNOLOGY PARK 669, FUHSING 3 RD., KUEISHAN, TAOYUAN, R.O.C., TAIWAN
Covered Property (1)
Dual Damascene Process Using a Single Photo Mask
Patent: 6,858,377 →
Application: 10/255,176 →
Publication: US 2003/0207180