Patent Assignment
Reel/Frame 013487/0908
Assignment of Assignor's Interest
Recorded: 2002-10-22
Pages: 9
Assignors
CHINN, JEFFREY D.
Executed: 2002-09-18
RATTNER, MICHAEL B.
Executed: 2002-09-04
PORNSIN-SORIRAK, NICHOLAS
Executed: 2002-10-02
LI, YANPING
Executed: 2002-09-23
Assignee
APPLIED MATERIALS, INC.
P.O. BOX 450-A, SANTA CLARA, CALIFORNIA, 95052
Covered Property
(1)
Method of Plasma Etching a Deeply Recessed Feature in a Substrate Using a Plasma Source Gas Modulated Etchant System