IP Library Assignment 013509/0985
Patent Assignment
Reel/Frame 013509/0985

Assignment of Assignor's Interest

Recorded: 2002-11-19 Pages: 2
Assignors
NAKANO, HIROYUKI
Executed: 2002-06-11
ARAI, TAKESHI
Executed: 2002-06-11
NAKATA, TOSHIHIKO
Executed: 2002-07-11
Assignee
HITACHI, LTD.
6, KANDA SURUGADAI 4-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Semiconductor Device Processing Method and Plasma Processing Method and Its Apparatus
Patent: 6,825,437 →
Application: 10/231,267 →
Publication: US 2003/0054655