Patent Assignment
Reel/Frame 013589/0189
Assignment of Assignor's Interest
Recorded: 2002-12-17
Received: 2002-12-23
Pages: 14
Assignor
STMICROELECTRONICS N.V.
Executed: 2002-06-26
Assignee
AMI SEMICONDUCTOR BELGIUM BVBA
WESTERRING 15, B-9700 OUDENAARDE, BEX, BELGIUM
Covered Properties
(4)
Method of processing a high voltage p++/n-well junction and a device manufactured by the method
Application:
09/950,835 →
Integrated Sine Wave Generating Circuit
Application:
09/897,075 →
Layout configurable electrostatic discharge device for integrated circuits
Application:
60/286,826 →
Method for Tungsten Chemical Vapor Deposition on a Semiconductor Substrate
Application:
09/768,151 →