IP Library Assignment 013618/0737
Patent Assignment
Reel/Frame 013618/0737

Assignment of Assignor's Interest

Recorded: 2002-12-30 Pages: 3
Assignors
NODA, TAKAAKI
Executed: 2002-09-30
MOROHASHI, AKIRA
Executed: 2002-09-30
ASAHI, JUNJI
Executed: 2002-09-30
Assignee
HITACHI KOKUSAI ELECTRIC INC.
14-20, 3-CHOME, HIGASHI-NAKANO, NAKANO-KU, TOKYO 164-8511, JAPAN
Covered Property (1)
Fabrication of B-Doped Silicon Film by Lpcvd Method Using BCI3 and SIH4 Gases
Patent: 6,905,963 →
Application: 10/255,715 →
Publication: US 2003/0077920
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Dec 31, 2018
From: HITACHI KOKUSAI ELECTRIC INC.
To: KOKUSAI ELECTRIC CORPORATION
Reel/Frame 048008/0206 →