Patent Assignment
Reel/Frame 048008/0206
Assignment of Assignor's Interest
Recorded: 2018-12-31
Pages: 23
Assignor
HITACHI KOKUSAI ELECTRIC INC.
Executed: 2018-12-05
Assignee
KOKUSAI ELECTRIC CORPORATION
3-4, KANDAKAJI-CHO, CHIYODA-KU, TOKYO, 101-0045, JAPAN
Covered Properties
(350)
Plasma Generation Apparatus
Patent:
6,238,512 →
Application:
09/234,488 →
Plasma Generating Apparatus and Semiconductor Manufacturing Method
Patent:
6,380,684 →
Application:
09/573,253 →
Hydrogen Annealing Process and Apparatus Therefor
Patent:
6,527,884 →
Application:
09/708,204 →
Plasma Processing Apparatus
Method and Apparatus for Manufacturing Semiconductor Device
Substrate Processing Apparatus and Substrate Processing Method
Method and Apparatus for Manufacturing Semiconductor Devices
Semiconductor Manufacturing Method, Substrate Processing Method, and Semiconductor Manufacturing Apparatus
Substrate Processing Apparatus
Dual Loading Port Semiconductor Processing Equipment
Semiconductor Manufacturing Apparatus, Remote Control System Therefor, and Remote Operation Device
Substrate Processing Apparatus
Method of Manufacturing Semiconductor Devices
Method and Apparatus for Processing Substrates and Method for Manufacturing a Semiconductor Device
Methods of Manufacturing Semiconductor Devices with Ruthenium Films Formed by Cvd Using an Oxygen-Containing Reactant Gas
Temperature Controlling Method, Thermal Treating Apparatus, and Method of Manufacturing Semiconductor Device
Substrate Processing Apparatus and Semiconductor Device Manufacturing Method
Substrate Processing Apparatus and Method for Manufacturing Semiconductor Device
System for Supplying Semiconductor Manufacturing System Control Programs
Substrate Processing Apparatus and Method for Manufacturing Semiconductor Device
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Method for Fabricating a Semiconductor Device
Method for Manufacturing Semiconductor Device Having an Etching Treatment
Substrate Processing Apparatus and Method for Manufacturing Semiconductor Device
Substrate Processing Apparatus and Semiconductor Device Producing Method
Temperature Control Method and Semiconductor Device Manufacturing Method
Method for Fabricating a Semiconductor Device and a Substrate Processing Apparatus
Fabrication of B-Doped Silicon Film by Lpcvd Method Using BCI3 and SIH4 Gases
Method for Fabricating a Semiconductor Device and a Substrate Processing Apparatus
Apparatus for Fabricating a Semiconductor Device
Method of Manufacturing a Semiconductor Device and a Semiconductor Manufacture System
Manufacturing Method of Semiconductor Device and Substrate Processing Apparatus
Method for Manufacturing Semiconductor Device
Method for Manufacturing Semiconductor Device
Heat Treatment Apparatus and Method for Processing Substrates
Vertical Type Semiconductor Device Producing Apparatus
Manufacturing Method of Semiconductor Device and Substrate Processing Apparatus
Substrate Treating Apparatus and Method for Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Thermal Treatment Apparatus, Method for Manufacturing Semiconductor Device, and Method for Manufacturing Substrate
Substrate Processing Apparatus and Method for Manufacturing a Semiconductor Device
Container, Container Producing Method, Substrate Processing Device, and Semiconductor Device Producing Method
Producing Method of Semiconductor Device and Substrate Processing Apparatus
Substrate Processing Equipment
Manufacturing Method of Semiconductor Device, and Substrate Processing Apparatus
Substrate Processing Apparatus
Producing Method of a Semiconductor Device Using Cvd Processing
Substrate Processing Apparatus , Substrate Holder, and Manufacturing Method of Semiconductor Device
Manufacturing Method of Semiconductor Device and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device and Apparatus for Processing Substrate
Semiconductor Manufacturing Device and Method for Manufacturing Semiconductor Devices
Substrate Processing Apparatus
Substrate Processing Apparatus and Semiconductor Device Producing Method
Substrate Processing Apparatus and Manufacturing Method for a Semiconductor Device
Method and Apparatus for Processing Substrates and Method for Manufacturing a Semiconductor Device
Semiconductor Device and Manufacturing Method Thereof
Substrate Processing Method
Substrate Processing Method
Semiconductor Device and Manufacturing Method of the Same
Substrate Processing Apparatus, and Method for Manufacturing Semiconductor Device
Patent:
7,648,578 →
Application:
11/547,137 →
Heat Treating Apparatus
Heat Treatment Apparatus and Method of Manufacturing Substrate
Substrate Treatment Apparatus
Heat Treatment Apparatus and Method of Manufacturing Substrates
Semiconductor Manufacturing Apparatus and Manufacturing of a Semiconductor Device
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Temperature Regulating Method, Thermal Processing System and Semiconductor Device Manufacturing Method
Producing Method of Semiconductor Device
Substrate Processing Apparatus and Producing Method of Semiconductor Device
Substrate Treating Apparatus and Semiconductor Device Manufacturing Method
Production Method for Semiconductor Device and Substrate Processing Apparatus
Semiconductor Device Manufacturing Method and Substrate Processing Apparatus
Batch-Type Remote Plasma Processing Apparatus
Semiconductor Device Manufacturing Method and Semiconductor Manufacturing Apparatus
Substrate Processing Apparatus
Substrate Processing Apparatus and Semiconductor Device Producing Method
Semiconductor Device Manufacturing Apparatus and Manufacturing Method of Semiconductor Device
Manufacturing Method of a Semiconductor Device, and Substrate Processing Apparatus
Substrate Processing Method and Substrate Processing Apparatus
Heat-Treating Apparatus and Method of Producing Substrates
Semiconductor Device Producing Method, Substrate Producing Method and Substrate Processing Apparatus
Substrate Processing System
Manufacturing Method of Semiconductor Device and Semiconductor Device Manufacturing Apparatus
Substrate Processing Apparatus and Attaching/Detaching Method of Reaction Vessel
Manufacturing Method of Semiconductor Device and Substrate Processing Apparatus
Substrate processing apparatus
Substrate Processing Apparatus, Method of Manufacturing a Semiconductor Device, and Method of Forming a Thin Film on Metal Surface
Semiconductor Device Producing Method with Selective Epitaxial Growth
Manufacturing Method of Semiconductor Device, and Substrate Processing Apparatus
Batch-Type Remote Plasma Processing Apparatus
Substrate Processing Apparatus and Reaction Container
Substrate Processing Apparatus and Reaction Container
Substrate processing apparatus for semiconductor devices
Method for Manufacturing Semiconductor Device Background
Substrate Processing Apparatus and Substrate Processing Method
Substrate Processing Apparatus and Manufacturing Method for Semiconductor Devices
Substrate Processing Apparatus Having Gas Side Flow via Gas Inlet
Substrate Processing Apparatus Having Covered Thermocouple for Enhanced Temperature Control
Substrate Processing Apparatus and Semiconductor Device Producing Method
Substrate Processing Apparatus, Coolant Gas Supply Nozzle and Semiconductor Device Manufacturing Method
Substrate Processing Apparatus
Substrate Processing Apparatus
Semiconductor Device Producing Method
Substrate Processing System
Substrate Processing Apparatus, Heating Apparatus for Use in the Same, Method of Manufacturing Semiconductors with Those Apparatuses, and Heating Element Supporting Structure
Substrate Processing Apparatus and Semiconductor Device Producing Method
Substrate Processing Method and Semiconductor Manufacturing Apparatus
Substrate Processing Method for Film Formation
Manufacturing Method of Semiconductor Apparatus
Substrate Processing Apparatus
Substrate Processing Apparatus and Method for Manufacturing Semiconductor Device
Substrate Processing System and Group Management System
Substrate Processing System and Data Retrieval Method
Manufacturing Method of Semiconductor Device
A Method of Manufacturing a Semiconductor Device
Semiconductor Device Manufacturing Method and Substrate Processing Apparatus
Substrate Processing Apparatus
Substrate Processing Method and Substrate Processing Apparatus
Substrate Processing Apparatus
Substrate Processing Apparatus and Substrate Processing Method
Semiconductor Device Producing Method and Substrate Processing Apparatus
Semiconductor Producing Device and Semiconductor Device Producing Method
Manufacturing Method of a Semiconductor Device and Substrate Processing Apparatus
Method of Producing a Semiconductor Device
Semiconductor Device Manufacturing Method
Semiconductor Device Manufacturing Method and Substrate Processing Apparatus
Manufacturing Method of Semiconductor Device, and Semiconductor Device
Substrate Processing Apparatus and Manufacturing Method of a Semiconductor Device
Heating Apparatus, Substrate Processing Apparatus, and Method of Manufacturing Semiconductor Devices
Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and insulator
Heating Apparatus, Substrate Processing Apparatus Employing the Same, Method of Manufacturing Semiconductor Devices, and Extending Member
Method of Manufacturing a Semiconductor Device and Processing Apparatus
Substrate processing apparatus
Manufacturing Method of Semiconductor Device and Substrate Processing Apparatus
Substrate Processing Apparatus and Semiconductor Device Manufacturing Method
Temperature Adjustment Method
Substrate Processing System
Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device Including Removal of Deposits from Process Chamber and Supply Portion
Device for Processing Substrate and Method of Manufacturing Semiconductor Device
Substrate Processing System and Operation Inspecting Method
Substrate Treatment Device and Manufacturing Method of Semiconductor Device
Substrate Processing Apparatus and Manufacturing Method of Semiconductor Device
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Temperature Control Method, Method of Obtaining a Temperature Correction Value, Method of Manufacturing a Semiconductor Device and Substrate Treatment Apparatus
Delay Adjusting Method and Lsi That Uses Air-Gap Wiring
Substrate Processing Apparatus
Substrate Processing Apparatus and Substrate Processing Method
Method for Manufacturing Semiconductor Device and Substrate Processing Apparatus
Semiconductor Device and Manufacturing Method of the Same
Substrate Processing Method and Substrate Processing Apparatus
Batch-Type Remote Plasma Processing Apparatus
Substrate Processing Apparatus, Method for Manufacturing Semiconductor Device, and Process Tube
Substrate Processing Apparatus
Substrate processing apparatus and method for manufacturing semiconductor device
Method for manufacturing semiconductor device and substrate processing apparatus
Substrate Processing Apparatus and Method for Manufacturing a Semiconductor Device
Substrate processing apparatus
Method of Manufacturing Semiconductor Device and Apparatus for Processing Substrate
Method of Manufacturing Semiconductor Device and Apparatus for Processing Substrate
Substrate processing apparatus
Substrate processing method and film forming method
Substrate Processing Apparatus and Substrate Processing System
Substrate Processing Apparatus
Temperature Regulating Method, Thermal Processing System and Semiconductor Device Manufacturing Method
Method of Manufacturing a Semiconductor Device
Batch-Type Remote Plasma Processing Apparatus
Producing Method of Semiconductor Device and Substrate Processing Apparatus
Producing Method of Semiconductor Device and Substrate Processing Apparatus
Producing Method of Semiconductor Device and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Substrate Processing Method and Substrate Processing Apparatus
Method of Producing Semiconductor Device
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Substrate Processing Apparatus, Heating Device, and Semiconductor Device Manufacturing Method
Manufacturing Method of Semiconductor Device and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Semiconductor producing device and semiconductor device producing method
Method for Manufacturing Semiconductor Device, and Substrate Processing Apparatus
Substrate Processing Method
Substrate Processing Apparatus and Semiconductor Device Manufacturing Method for Forming Film
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Setup Method of Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device
Substrate processing apparatus and substrate processing method
Substrate Processing Apparatus and Substrate Processing Method
Manufacturing Method of a Semiconductor Device Having Wirings
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Method of Fabricating Non-Volatile Semiconductor Memory Device by Using Plasma Film-Forming Method and Plasma Nitridation
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Substrate Processing Apparatus and Reaction Tube for Processing Substrate
Method of Manufacturing Semiconductor Device, Cleaning Method and Cleaning Control Apparatus
Semiconductor Device Producing Method
Manufacturing Method of Semiconductor Substrate and Substrate Processing Apparatus
Manufacturing Method of Semiconductor Device and Substrate Processing Apparatus
Device for Processing a Substrate, Method of Processing a Substrate and Method of Manufacturing Semiconductor Device
Substrate Treatment Equipment and Manufacturing Method of Substrate
Substrate Processing Apparatus and Manufacturing Method of Semiconductor Device
Substrate Treating Apparatus and Method for Manufacturing Semiconductor Device
Substrate Processing Apparatus
Semiconductor Device Manufacturing Method and Substrate Processing Apparatus
Production Method for Semiconductor Device
Method of Manufacturing a Semiconductor Device and Substrate Processing Apparatus
Substrate Processing Apparatus and Manufacturing Method of Semiconductor Device Using Plasma Generation
Substrate processing system and group management system
Substrate Processing Apparatus and Reaction Container
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Semiconductor Device
Method of Manufacturing Semiconductor Device
Substrate Processing Apparatus and Semiconductor Devices Manufacturing Method
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Method of Processing Substrate and Substrate Processing Apparatus
Substrate Processing Apparatus, Control Method of the Substrate Processing Apparatus, Manufacturing Method of Semiconductor Device and Apparatus State Shifting Method
Substrate Processing System and Data Retrieval Method
Substrate Treating Apparatus and Method for Manufacturing Semiconductor Device
Semiconductor Device and Manufacturing Method of the Same
Substrate Processing Apparatus
Method of Manufacturing a Semiconductor Device
Substrate Processing Apparatus
Substrate Treatment Device
Substrate Processing Apparatus and Semiconductor Devices Manufacturing Method
Substrate Processing Apparatus
Substrate Processing Apparatus
Substrate Processing Apparatus and Semiconductor Device Producing Method
Device for Processing a Substrate, Method of Processing a Substrate and Method of Manufacturing Semiconductor Device
Control System of Substrate Processing Apparatus, Collecting Unit, Substrate Processing Apparatus and Control Method of the Substrate Processing Apparatus
Semiconductor Device Producing Method
Substrate Processing Apparatus, Processing Tube, Substrate Holder, Fixing Part of the Substrate Holder, Substrate Processing Method, and Substrate Manufacturing Method
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Substrate Carrying Mechanism, Substrate Processing Apparatus, and Semiconductor Device Manufacturing Method
Substrate Processing Apparatus and Semiconductor Device Manufacturing Method
Substrate Processing Apparatus and Method for Manufacturing a Semiconductor Device
Substrate Processing Apparatus and Producing Method of Semiconductor Device
Method of Producing Semiconductor Device
Substrate Processing Apparatus and Method for Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Semiconductor Device, Method of Manufacturing Semiconductor Device and System of Processing Substrate
Substrate Processing Apparatus, Method for Manufacturing Semiconductor Device, Method for Processing Substrates
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Substrate Processing Apparatus
Semiconductor Device Manufacturing and Processing Methods and Apparatuses for Forming a Film
Semiconductor Manufacturing Apparatus and Semiconductor Device Manufacturing Method
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Temperature Detecting Apparatus, Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Semiconductor Device and Manufacturing Method of the Same
Substrate Processing Apparatus Capable of Cleaning Inside Thereof and Cleaning Control Apparatus for Controlling Cleaning Process of Substrate Processing Apparatus
Method for Manufacturing Semiconductor Device and Method for Processing Substrate
Substrate Processing Apparatus and Substrate Processing System
Substrate Processing System and Group Managing Apparatus
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Substrate Processing Method, Substrate Processing Apparatus and Non-Transitory Computer Readable Recording Medium
Method of Manufacturing Semiconductor Device, Method of Processing Substrate and Non-Transitory Computer Readable Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Method, Substrate Processing Apparatus and Recording Medium
Method for Manufacturing Semiconductor Device, Method for Processing Substrate and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, Substrate Processing Apparatus, and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Cleaning Method, Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medium
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Substrate Processing Method and Substrate Processing Apparatus
Batch-Type Remote Plasma Processing Apparatus
Substrate Processing Apparatus and Semiconductor Device Manufacturing Method
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device and Method of Processing Substrate
Method of Manufacturing Semiconductor Device and Method of Processing Substrate
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Program
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Substrate Processing Apparatus, Substrate Processing Method, Non-Transitory Computer-Readable Recording Medium, and Substrate Transfer Method
Semiconductor Device Manufacturing Method and Substrate Manufacturing Method of Forming Silicon Carbide Films on the Substrate
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Substrate Processing Apparatus, Method of Transferring Substrate, Method of Manufacturing Semiconductor Device, and State Detecting Program
Substrate Processing Apparatus, Method of Processing Substrate and Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device
Method of Manufacturing a Semiconductor Device, Method of Processing a Substrate, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Cleaning Method, Substrate Processing Apparatus and Non-Transitory Computer Readable Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Method, Computer-Readable Medium with Program for Executing a Substrate Processing Method, and Substrate Processing Apparatus
Substrate Processing System
Group Management Apparatus, Substrate Processing System and Method of Managing Files of Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Method of Processing Substrate and Substrate Processing Apparatus
Method of Manufacturing an Oxynitride Film for a Semiconductor Device
Substrate Processing Apparatus, Substrate Supporter and Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Method and Substrate Processing Apparatus
Substrate Processing Apparatus, Method for Manufacturing Substrate, and Method for Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Method and Substrate Processing Apparatus
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Reaction Tube, Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Non-Transitory Computer Readable Recording Medium
Method, APPARATUS, AND NON-TRANSITORY COMPUTER READABLE RECORDING MEDIUM FOR MANUFACTURING A SEMICONDUCTOR DEVICE WITH AN AMORPHOUS OXIDE FILM
Method for Manufacturing Semiconductor Device and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Substrate Processing Method and Substrate Processing Apparatus
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium
Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medium
Substrate Processing Apparatus, Non-Transitory Computer-Readable Recording Medium and Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, Substrate Processing System and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device
Method for Manufacturing Semiconductor Device, Method for Processing Substrate, Substrate Processing Apparatus and Recording Medium
Apparatus for Manufacturing Semiconductor Device, Method of Manufacturing Semiconductor Device, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Non-transitory Computer-readable Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Method, Substrate Processing Apparatus, and Recording Medium
Temperature Detecting Apparatus, Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Substrate Processing Apparatus, Method for Manufacturing Semiconductor Device and Computer-Readable Recording Medium
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium
Patent:
9,171,734 →
Application:
14/490,882 →
Substrate Processing Apparatus, Method for Manufacturing Semiconductor Device and Computer-Readable Recording Medium
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Non-Transitory Computer Readable Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device
Semiconductor Device, Method of Manufacturing Semiconductor Device and System of Processing Substrate
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium
Method for Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Substrate Processing Apparatus, Non-Transitory Computer-Readable Recording Medium and Method of Manufacturing Semiconductor Device
Substrate Processing Apparatus and Semiconductor Device Manufacturing Method
Substrate Processing Apparatus and Semiconductor Device Manufacturing Method
Substrate Processing Apparatus
Method for Manufacturing Semiconductor Device, Method for Processing Substrate and Substrate Processing Apparatus
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium
Substrate Processing Apparatus, Method for Manufacturing Semiconductor Device and Computer-Readable Recording Medium
Semiconductor Device Manufacturing Method and Substrate Processing Apparatus
Batch-Type Remote Plasma Processing Apparatus
Method of Manufacturing Semiconductor Device and Substrate Processing Method
Method of Manufacturing Semiconductor Device and Substrate Processing Method
Method for Processing Substrate and Substrate Processing Apparatus
Semiconductor Device Manufacturing and Processing Methods and Apparatuses for Forming a Film
Method of Manufacturing Semiconductor Device, Substrate Processing Method and Substrate Processing Apparatus
Method for Manufacturing Semiconductor Device, Method for Processing Substrate, Substrate Processing Apparatus and Recording Medium
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium
Semiconductor Device Manufacturing Method and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Substrate Processing Method and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, Substrate Processing System and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device Including Silicon Nitride Layer for Inhibiting Excessive Oxidation of Polysilicon Film
Method of Manufacturing Semiconductor Device
Patent:
9,484,249 →
Application:
15/058,718 →
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device and Substrate Processing Method
Method of Manufacturing Semiconductor Device
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device
Patent:
9,607,908 →
Application:
15/273,330 →
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device Having 3D Structure
Patent:
9,685,455 →
Application:
15/385,133 →
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device
Reaction Tube
Patent:
618,638 →
Application:
29/327,478 →
Reaction Tube
Patent:
610,559 →
Application:
29/327,745 →
Boat for Substrate Processing Apparatus
Patent:
740,769 →
Application:
29/467,526 →
Boat for Substrate Processing Apparatus
Patent:
739,831 →
Application:
29/467,533 →
Related Assignments
(21)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Jan 21, 1999
From: LI, YUNLONG; SATO, NORIYOSHI; IIZUKA, SATORU
To: KOKUSAI ELECTRIC CO., LD.; SATO, NORIYOSHI
Reel/Frame 009718/0380 →
Assignment of Assignor's Interest
Sep 18, 2000
From: LI, YUNLONG; SATO, MASANOBU; TOMINAGA, YOSHIO; SATO, NORIYOSHI
To: KOKUSAI ELECTRIC CO., LTD.; SATO, NORIYOSHI
Reel/Frame 011081/0098 →
Change of Name
Oct 25, 2000
From: KOKUSAI ELECTRIC CO., LTD.
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 011276/0794 →
Assignment of Assignor's Interest
Nov 8, 2000
From: TAKAKUWA, YASUNORI; TOMETSUKA, KOUJI
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 011367/0593 →
Assignment of Assignor's Interest
Mar 9, 2001
From: MATSUYAMA, NAOKO; SASAKI, SINYA
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 011573/0068 →
Invalid Assignment, See Recording at Reel 012591, Frame 0894. (Re-Recorded to Correct the Recordation Date)
Mar 20, 2001
From: OGAWA, UNRYU; SATO, TAKAYUKI
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 011634/0618 →
Assignment of Assignor's Interest
Mar 26, 2001
From: OGAWA, UNRYU; SATO, TAKAYUKI
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 012591/0894 →
Assignment of Assignor's Interest
Mar 29, 2001
From: ITATANI, HIDEHARU; TSUNEDA, MASAYUKI
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 011660/0286 →
Assignment of Assignor's Interest
May 7, 2001
From: IKEDA, KAZUHITO; NISHITANI, EISUKE; SAKUMA, HARUNOBU; NAKAGOMI, KAZUHIRO
To: HITACHI KOKUSAI ELECTRIC INC
Reel/Frame 011774/0388 →
Assignment of Assignor's Interest
May 9, 2001
From: TAKANO, SATOSHI
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 011780/0538 →
Assignment of Assignor's Interest
Jun 18, 2001
From: NAKASHIMA, TAKANOBU; MATSUNAGA, TATSUHISA; YANAGAWA, HIDEHIRO
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 011905/0518 →
Assignment of Assignor's Interest
Jul 12, 2001
From: TOMETSUKA, KOUJI
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 011980/0984 →
Assignment of Assignor's Interest
Sep 26, 2001
From: ITATANI, HIDEHARU; TSUNEDA, MASAYUKI; SANO, ATSUSHI; OHOKA, TSUKASA
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 012201/0074 →
Assignment of Assignor's Interest
Oct 25, 2001
From: SAITO, TSUYOSHI; YOKOGAWA, KAZUHIRO
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 012611/0247 →
Assignment of Assignor's Interest
Dec 5, 2001
From: MATSUNAGA, TATSUHISA; NOTO, KOUICHI
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 012344/0294 →
Assignment of Assignor's Interest
Dec 5, 2001
From: MATSUNAGA, TATSUHISA; TERAMOTO, MASAHIRO; AKUTSU, NORIO; NOTO, KOUICHI
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 012347/0960 →
Corrective Assignment to Correct the Assignee's Name, Previously Recorded at Reel 0112207 Frame 0784.
Dec 18, 2001
From: YUMURA, TAKASHI; ARAKI, HIROSHI
To: MITSUBISHI DENKI KABUSHIKI KAISHA
Reel/Frame 012377/0917 →
Assignment of Assignor's Interest
Dec 21, 2001
From: TANAKA, KAZUO; UENO, MASAAKI; NAKANO, MINORU; YAMAGUCHI, HIDETO
To: HITACHI KOKUSAI ELECTRIC, INC.
Reel/Frame 012395/0931 →
Assignment of Assignor's Interest
Dec 28, 2001
From: SANO, ATSUSHI; OHOKA, TSUKASA
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 012398/0534 →
Assignment of Assignor's Interest
Feb 1, 2002
From: KASANAMI, KATSUHISA; NISHITANI, EISUKE; NISHIWAKI, MICHIKO; OKADA, SATOSHI
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 012578/0698 →
Assignment of Assignor's Interest
Mar 14, 2002
From: KOGANO, MINORU; INOKUCHI, YASUHIRO; SAMBU, MAKOTO; MORIYA, ATSUSHI
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 012674/0755 →