Substrate processing apparatus and producing method of semiconductor device
View Patent ↗A substrate treatment apparatus includes a reaction tube and a heater heating a silicon wafer. Trimethyl aluminum (TMA) and ozone (O 3 ) are alternately fed into the reaction tubeto generate Al 2 O 3 film on the surface of the wafer. The apparatus also includes supply tubes and for flowing the ozone and TMA and a nozzle supplying gas into the reaction tube. The two supply tubes are connected to the nozzle disposed inside the heater in a zone inside the reaction tube where a temperature is lower than a temperature near the wafer, and the ozone and TMA are supplied into the reaction tube through the nozzle.
1. A producing method of a semiconductor device, comprising:
transferring a plurality of substrates into a processing chamber that includes:
a connection portion where a first gas supply tube and a second gas supply tube merge with each other,
a gas supply member which is connected downstream of the connection portion, said downstream direction being defined along the flow of gas into the processing chamber, the gas supply member including a plurality of gas supply holes, and
a substrate holding section configured to hold a plurality of substrates;
adjusting a temperature of the connection portion to a temperature at which a second gas is not decomposed, and
adjusting a temperature of a portion of the gas supply member at least including the plurality of gas supply holes, to a temperature at which the second gas is decomposed; and
after adjusting said temperatures, supplying gas by repeating the following steps of (a) supplying a first gas and (b) supplying a second gas,
said step (a) being a step of supplying a first gas into the processing chamber from a first gas supply source through the first gas supply tube, the connection portion, and the gas supply member, and
said step (b) being a step of supplying a second gas into the processing chamber from a second gas supply source through the second gas supply tube, the connection portion, and the gas supply member,
to deposit a product stemming from a reaction between the first gas and the second gas on surfaces of the substrates and on an inner wall of the gas supply member.
2. The producing method of a semiconductor device as recited in claim 1 , wherein
a path between the first gas supply source and the gas supply member is in communication while a path between the second gas supply source and the gas supply member is closed in the first gas supplying step; and
a path between the second gas supply source and the gas supply member is in communication while a path between the first gas supply source and the gas supply member is closed in the second gas supplying step.
3. The producing method of a semiconductor device as recited in claim 2 , further comprising the following steps of:
after supplying the gas:
transferring the plurality of substrates out from the processing chamber; and
supplying a cleaning gas into the processing chamber through the gas supply member, thereby performing cleaning of the processing chamber and removing a film formed on the gas supply member.
4. The producing method of a semiconductor device as recited in claim 2 , wherein adhesion, to the gas supply member, of the second gas at a temperature equal to or higher than a decomposition temperature of the second gas, is lower than adhesion, to the gas supply member, of matter which is generated from a reaction between the first gas and the second gas.
5. The producing method of a semiconductor device as recited in claim 4 , further comprising the following steps of:
after supplying the gas:
transferring the plurality of substrates out from the processing chamber; and
supplying a cleaning gas into the processing chamber through the gas supply member, thereby performing cleaning of the processing chamber and removing a the-film formed on the gas supply member.
6. The producing method of a semiconductor device as recited in claim 1 , further comprising the following steps of:
after supplying the gas:
transferring the plurality of substrates out from the processing chamber; and
supplying a cleaning gas into the processing chamber through the gas supply member, thereby performing cleaning of the processing chamber and removing a film formed on the gas supply member.
7. The producing method of a semiconductor device as recited in claim 1 , wherein
adhesion, to the gas supply member, of the second gas at a temperature equal to or higher than a decomposition temperature of the second gas, is lower than adhesion, to the gas supply member, of matter which is generated from a reaction between the first gas and the second gas.
8. The producing method of a semiconductor device as recited in claim 7 , further comprising the following steps of:
after supplying the gas:
transferring the plurality of substrates out from the processing chamber; and
supplying a cleaning gas into the processing chamber through the gas supply member, thereby performing cleaning of the processing chamber and removing a film formed on the gas supply member.
9. The producing method of a semiconductor device as recited in claim 1 , wherein the product has an adhesion property which prevents the product from peeling off from the inner wall of the gas supply member.